The influence of interfacial tensile strain on the charge transport characteristics of MoS2-based vertical heterojunction devices. Issue 40 (30th September 2016)
- Record Type:
- Journal Article
- Title:
- The influence of interfacial tensile strain on the charge transport characteristics of MoS2-based vertical heterojunction devices. Issue 40 (30th September 2016)
- Main Title:
- The influence of interfacial tensile strain on the charge transport characteristics of MoS2-based vertical heterojunction devices
- Authors:
- Huang, Fu
Cho, Byungjin
Chung, Hee-Suk
Son, Seung Bae
Kim, Jung Han
Bae, Tae-Sung
Yun, Hyung Joong
Sohn, Jung Inn
Oh, Kyu Hwan
Hahm, Myung Gwan
Park, Jung Hee
Hong, Woong-Ki - Abstract:
- Abstract : Charge transport characteristics of MoS2 -based vertical heterojunctions. Abstract : We demonstrate the charge transport characteristics of MoS2 -based vertical heterojunction devices through the formation of interfacial strain. Atomically thin MoS2 bilayers were directly synthesized on a p-type Si substrate by using chemical vapor deposition to introduce an interfacial tensile strain in the vertical heterojunction diode structure, which was confirmed by Raman, X-ray and ultraviolet photoelectron spectroscopy techniques. The electrical and optoelectronic properties of the heterojunction devices with the as-grown MoS2 (A-MoS2 ) on p-Si were compared with those of transferred MoS2 (T-MoS2 )/p-Si devices. To clearly understand the charge transport characteristics induced by the interfacial tensile strain, the Fowler–Nordheim (FN) analysis of the electrical properties of the diode devices was conducted with the corresponding energy band diagrams. All of the fabricated MoS2 -based vertical diodes exhibited clearly rectifying behaviors, but the photoresponse properties of the A-MoS2 -based and T-MoS2 -based heterojunctions exhibited distinct differences. Interestingly, we found that the tunneling barrier heights of the A-MoS2 -based heterojunction devices were relatively higher than those of the T-MoS2 -based devices and were almost the same before and after illumination due to the interfacial tensile strain, whereas those of the T-MoS2 -based devices were lowered afterAbstract : Charge transport characteristics of MoS2 -based vertical heterojunctions. Abstract : We demonstrate the charge transport characteristics of MoS2 -based vertical heterojunction devices through the formation of interfacial strain. Atomically thin MoS2 bilayers were directly synthesized on a p-type Si substrate by using chemical vapor deposition to introduce an interfacial tensile strain in the vertical heterojunction diode structure, which was confirmed by Raman, X-ray and ultraviolet photoelectron spectroscopy techniques. The electrical and optoelectronic properties of the heterojunction devices with the as-grown MoS2 (A-MoS2 ) on p-Si were compared with those of transferred MoS2 (T-MoS2 )/p-Si devices. To clearly understand the charge transport characteristics induced by the interfacial tensile strain, the Fowler–Nordheim (FN) analysis of the electrical properties of the diode devices was conducted with the corresponding energy band diagrams. All of the fabricated MoS2 -based vertical diodes exhibited clearly rectifying behaviors, but the photoresponse properties of the A-MoS2 -based and T-MoS2 -based heterojunctions exhibited distinct differences. Interestingly, we found that the tunneling barrier heights of the A-MoS2 -based heterojunction devices were relatively higher than those of the T-MoS2 -based devices and were almost the same before and after illumination due to the interfacial tensile strain, whereas those of the T-MoS2 -based devices were lowered after illumination. Our study will help further understand the charge transport properties of 2D material-based heterojunction devices in the presence of interfacial strain, ultimately enabling the design of electronic and optoelectronic devices with novel functionalities. … (more)
- Is Part Of:
- Nanoscale. Volume 8:Issue 40(2016)
- Journal:
- Nanoscale
- Issue:
- Volume 8:Issue 40(2016)
- Issue Display:
- Volume 8, Issue 40 (2016)
- Year:
- 2016
- Volume:
- 8
- Issue:
- 40
- Issue Sort Value:
- 2016-0008-0040-0000
- Page Start:
- 17598
- Page End:
- 17607
- Publication Date:
- 2016-09-30
- Subjects:
- Nanoscience -- Periodicals
Nanotechnology -- Periodicals
620.505 - Journal URLs:
- http://www.rsc.org/Publishing/Journals/NR/Index.asp ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c6nr05937f ↗
- Languages:
- English
- ISSNs:
- 2040-3364
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9830.266000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 1088.xml