Cite
APA Citation
Lee, K., Jang, J., Park, S. J., Ji, C., Yang, S., Guo, L. J., & Park, H. J. (n.d.). nanoimprint Lithography: Angle‐Insensitive and CMOS‐Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016). Advanced optical materials, 4(11), 1695. http://access.bl.uk/ark:/81055/vdc_100039146079.0x000043