Cite
HARVARD Citation
Lee, K. et al. (n.d.). Nanoimprint Lithography: Angle‐Insensitive and CMOS‐Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016). Advanced optical materials. 4 (11), p. 1695. [Online].
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Lee, K. et al. (n.d.). Nanoimprint Lithography: Angle‐Insensitive and CMOS‐Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016). Advanced optical materials. 4 (11), p. 1695. [Online].