Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors. (2016)

• Record Type: Journal Article
• Authors: Jogschies, L.; Rittinger, J.; Klaas, D.; Wurz, M.C.
• Is Part Of: Procedia technology. Volume 26(2016)
• Page Start: 162
• Page End: 168
• Publication Date: 2016
• Subjects: Flexible Substrate -- Collaborative Research Center 653 -- stress in metallic thin films; Technology -- Congresses; Technology -- Periodicals; Engineering -- Congresses; Engineering -- Periodicals; Engineering; Technology; Conference proceedings; Periodicals; 605
• DOI: 10.1016/j.protcy.2016.08.022
• Languages: English
• ISSNs: 2212-0173

Abstract

Abstract: Flexible magnetic field sensors using the anisotropic magnetoresistive effect that have been developed within the Collaborative Research Center 653 are to be transferred into industrial applications. Occurring challenges result from interactions between the flexible polyimide substrate and the functional layer namely a thin NiFe 81/19 film deposited by a DC sputter process. We have optimized the DC sputter process with regard to stress and roughness reduction.