A new analytical drain current model of cylindrical gate silicon tunnel FET with source δ-doping. (September 2016)
- Record Type:
- Journal Article
- Title:
- A new analytical drain current model of cylindrical gate silicon tunnel FET with source δ-doping. (September 2016)
- Main Title:
- A new analytical drain current model of cylindrical gate silicon tunnel FET with source δ-doping
- Authors:
- Dash, Sidhartha
Jena, Biswajit
Mishra, Guru Prasad - Abstract:
- Abstract: A new δ-doped cylindrical gate silicon tunnel FET (DCG-TFET) analytical model is developed and investigated extensively, with the aim of addressing the challenges of the conventional CG-TFET. The improvement in tunneling probability of charge carriers has been achieved by inserting a δ-doping sheet in the source region which leads to high drain current as compared to CG-TFET. The effect of distance between the δ-doping sheet and source/channel interface on the current performance, sub-threshold swing (SS) and threshold voltage ( V t h ) has been examined. The instantaneous position of δ-doping region from the tunneling junction is optimized based on the trade-off between current ratio and SS. The present model exhibit maximum switching current ratio ( I O N I O F F ≅ 10 12 ) for an optimum distance of 2 nm without degrading SS (SS∼55 mV/decade) and V th performance. The electrostatic behavior of the present model is obtained using the solution of Poisson's equation in the cylindrical coordinate system. However the impact of scaling of the gate oxide thickness and cylindrical pillar diameter on drain current performance has been discussed. In future, DCG-TFET can be one of the potential successors for ultra-low-power applications because of its improved drain current and switching ratio. Highlights: A new δ-doped cylindrical gate silicon tunnel FET (DCG-TFET) analytical model is proposed. The effect of distance from tunneling junction on drain current, SS and V thAbstract: A new δ-doped cylindrical gate silicon tunnel FET (DCG-TFET) analytical model is developed and investigated extensively, with the aim of addressing the challenges of the conventional CG-TFET. The improvement in tunneling probability of charge carriers has been achieved by inserting a δ-doping sheet in the source region which leads to high drain current as compared to CG-TFET. The effect of distance between the δ-doping sheet and source/channel interface on the current performance, sub-threshold swing (SS) and threshold voltage ( V t h ) has been examined. The instantaneous position of δ-doping region from the tunneling junction is optimized based on the trade-off between current ratio and SS. The present model exhibit maximum switching current ratio ( I O N I O F F ≅ 10 12 ) for an optimum distance of 2 nm without degrading SS (SS∼55 mV/decade) and V th performance. The electrostatic behavior of the present model is obtained using the solution of Poisson's equation in the cylindrical coordinate system. However the impact of scaling of the gate oxide thickness and cylindrical pillar diameter on drain current performance has been discussed. In future, DCG-TFET can be one of the potential successors for ultra-low-power applications because of its improved drain current and switching ratio. Highlights: A new δ-doped cylindrical gate silicon tunnel FET (DCG-TFET) analytical model is proposed. The effect of distance from tunneling junction on drain current, SS and V th has been examined. The distance is optimized based on the trade-off between current switching ratio and SS. The present model exhibit high switching current ratio for an optimum distance of 2 nm. … (more)
- Is Part Of:
- Superlattices and microstructures. Volume 97(2016)
- Journal:
- Superlattices and microstructures
- Issue:
- Volume 97(2016)
- Issue Display:
- Volume 97, Issue 2016 (2016)
- Year:
- 2016
- Volume:
- 97
- Issue:
- 2016
- Issue Sort Value:
- 2016-0097-2016-0000
- Page Start:
- 231
- Page End:
- 241
- Publication Date:
- 2016-09
- Subjects:
- DCG-TFET -- Switching ratio -- Threshold voltage -- δ-Doping sheet
Superlattices as materials -- Periodicals
Microstructure -- Periodicals
Semiconductors -- Periodicals
Superréseaux -- Périodiques
Microstructure (Physique) -- Périodiques
Semiconducteurs -- Périodiques
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/07496036 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.spmi.2016.06.018 ↗
- Languages:
- English
- ISSNs:
- 0749-6036
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8547.076700
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 1335.xml