Cite
HARVARD Citation
Hartmann, C. et al. (2016). Preparation of deep UV transparent AlN substrates with high structural perfection for optoelectronic devices. CrystEngComm. 18 (19), pp. 3488-3497. [Online].
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Hartmann, C. et al. (2016). Preparation of deep UV transparent AlN substrates with high structural perfection for optoelectronic devices. CrystEngComm. 18 (19), pp. 3488-3497. [Online].