Cite
APA Citation
Jeschke, J., Möckel, S., Korb, M., Rüffer, T., Assim, K., Melzer, M., Herwig, G., Georgi, C., Schulz, S. E., & Lang, H. (2016). chemical vapor deposition of ruthenium-based layers by a single-source approach. Journal of materials chemistry, 4(12), 2319–2328. http://access.bl.uk/ark:/81055/vdc_100031257878.0x000004