Cite
HARVARD Citation
Jeschke, J. et al. (2016). Chemical vapor deposition of ruthenium-based layers by a single-source approach. Journal of materials chemistry. 4 (12), pp. 2319-2328. [Online].
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Jeschke, J. et al. (2016). Chemical vapor deposition of ruthenium-based layers by a single-source approach. Journal of materials chemistry. 4 (12), pp. 2319-2328. [Online].