Density functional theory calculations for estimation of gettering sites of C, H, intrinsic point defects and related complexes in Si wafers. (15th March 2016)
- Record Type:
- Journal Article
- Title:
- Density functional theory calculations for estimation of gettering sites of C, H, intrinsic point defects and related complexes in Si wafers. (15th March 2016)
- Main Title:
- Density functional theory calculations for estimation of gettering sites of C, H, intrinsic point defects and related complexes in Si wafers
- Authors:
- Shirasawa, Sho
Sueoka, Koji
Yamaguchi, Tadashi
Maekawa, Kazuyoshi - Abstract:
- Abstract: Very recently, a C3 H5 cluster ion implantation technique for proximity gettering has been reported with the low energy of around 10 15 /cm 2 dose without recovery heat treatments. The main feature of this technique is that the gettering efficiency is higher than that by C monomer implantation, even though irradiation defects are too small to clarify by TEM observation. In the present work, we evaluate the binding energies of metal atoms with candidate gettering sites of C, H, intrinsic point defects and related complexes in Si wafers induced by C3 H5 cluster ion implantation or different methods, for example, H implantation etc. by using density functional theory calculations. In addition to C and H atoms, we consider donor P and O atoms contained in an n- CZ-Si wafer for use in a CMOS image sensor. The simplest complexes of substitutional/interstitial C (Cs /Ci ), Hi, Ps, Oi, and incorporated intrinsic point defects (vacancy ( V ) and self-interstitial Si ( I )) by C3 H5 implantation were also considered. We found that Cs – I (= Ci ), Ci –Ci, Hi – I, V Hn ( n =1–3), and V O complexes are the best candidates for gettering sites. Gettering by C3 H5 cluster ion implantation is more effective than that by C monomer implantation due to the formation of V Hn ( n =1–3) and Hi – I complexes, which provides more effective gettering sites.
- Is Part Of:
- Materials science in semiconductor processing. Volume 44(2016:Mar.)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 44(2016:Mar.)
- Issue Display:
- Volume 44 (2016)
- Year:
- 2016
- Volume:
- 44
- Issue Sort Value:
- 2016-0044-0000-0000
- Page Start:
- 13
- Page End:
- 17
- Publication Date:
- 2016-03-15
- Subjects:
- Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2016.01.001 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5396.440600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 608.xml