Cite
HARVARD Citation
Delabie, A. et al. (2015). Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents. Chemical communications. 51 (86), pp. 15692-15695. [Online].
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Delabie, A. et al. (2015). Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents. Chemical communications. 51 (86), pp. 15692-15695. [Online].