Interface annealing characterization of Ti/Al/Au ohmic contacts to p-type 4H-SiC*Project supported by the Key Specific Projects of Ministry of Education of China (No. 625010101), the Specific Project of the Core Devices (No. 2013ZX01001001-004), and the Science Project of State Grid (No. SGRI-WD-71-14-004). (December 2015)
- Record Type:
- Journal Article
- Title:
- Interface annealing characterization of Ti/Al/Au ohmic contacts to p-type 4H-SiC*Project supported by the Key Specific Projects of Ministry of Education of China (No. 625010101), the Specific Project of the Core Devices (No. 2013ZX01001001-004), and the Science Project of State Grid (No. SGRI-WD-71-14-004). (December 2015)
- Main Title:
- Interface annealing characterization of Ti/Al/Au ohmic contacts to p-type 4H-SiC*Project supported by the Key Specific Projects of Ministry of Education of China (No. 625010101), the Specific Project of the Core Devices (No. 2013ZX01001001-004), and the Science Project of State Grid (No. SGRI-WD-71-14-004).
- Authors:
- Han 韩, Chao 超
Zhang 张, Yuming 玉明
Song 宋, Qingwen 庆文
Tang 汤, Xiaoyan 晓燕
Guo 郭, Hui 辉
Zhang 张, Yimen 义门
Yang 杨, Fei 霏
Niu 钮, Yingxi 应喜 - Abstract:
- Abstract: Ti/Al/Au ohmic contacts to p-type 4H-SiC in terms of a different annealing time and Ti composition are reported. At 1050 °C, proper increase in annealing time plays a critical role in the Schottky to ohmic contact conversion. With the optimized annealing time, the contact with a high Ti content yields a lower specific contact resistivity ( ρ c ) of 6.4 × 10 −5 Ω·cm 2 compared with the low-Ti contact. The annealed surface morphology and phase resultants were examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD), respectively. For the better ohmic contact, element distribution and chemical states were qualitatively identified by X-ray photoelectron spectroscopy (XPS) depth analysis. In particular, the presence of C and a Si-related phase was discussed and associated with the change in the surface status of the as-grown epilayer of 4H-SiC during annealing. The results reveal that the out-diffused C and Si atoms, with an approximate atomic ratio of 1 : 1 in the contact layer, can combine to form an amorphous Si–C state. The polycrystalline graphite instead of an unreacted C cluster in the whole alloyed structure and an extra nanosize graphite flake on the outermost surface of the annealed contact were confirmed by Raman spectroscopy.
- Is Part Of:
- Journal of semiconductors. Volume 36:Number 12(2015:Dec.)
- Journal:
- Journal of semiconductors
- Issue:
- Volume 36:Number 12(2015:Dec.)
- Issue Display:
- Volume 36, Issue 12 (2015)
- Year:
- 2015
- Volume:
- 36
- Issue:
- 12
- Issue Sort Value:
- 2015-0036-0012-0000
- Page Start:
- Page End:
- Publication Date:
- 2015-12
- Subjects:
- 2520
4H-SiC -- p-type -- ohmic contact -- titanium -- aluminum -- gold
Semiconductors -- Periodicals
621.38152 - Journal URLs:
- http://iopscience.iop.org/1674-4926/ ↗
http://www.iop.org/EJ/journal/jos ↗
http://www.iop.org/ ↗ - DOI:
- 10.1088/1674-4926/36/12/123006 ↗
- Languages:
- English
- ISSNs:
- 1674-4926
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
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British Library STI - ELD Digital store - Ingest File:
- 520.xml