Low‐Temperature Synthesis of Large‐Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma‐Enhanced Chemical Vapor Deposition. (10th August 2015)

• Record Type: Journal Article
• Authors: Ahn, Chisung; Lee, Jinhwan; Kim, Hyeong‐U; Bark, Hunyoung; Jeon, Minhwan; Ryu, Gyeong Hee; Lee, Zonghoon; Yeom, Geun Young; Kim, Kwangsu; Jung, Jaehyuck; Kim, Youngseok; Lee, Changgu; Kim, Taesung
• Is Part Of: Advanced materials. Volume 27:Number 35(2015)
• Page Start: 5223
• Page End: 5229
• Publication Date: 2015-08-10
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201501678
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en" id="adma201501678-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>By plasma‐enhanced chemical vapor deposition</bold>, a molybdenum disulfide (MoS₂) thin film is synthesized directly on a wafer‐scale plastic substrate at below 300 °C. The carrier mobility of the films is 3.74 cm² V⁻¹ s⁻¹. Also, humidity is successfully detected with MoS₂‐based sensors fabricated on the flexible substrate, which reveals its potential for flexible sensing devices. <graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgj2n0rvrjn" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </abstract>