Cite
HARVARD Citation
Minjauw, M. et al. (2015). Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma. Journal of materials chemistry. 3 (19), pp. 4848-4851. [Online].
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Minjauw, M. et al. (2015). Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma. Journal of materials chemistry. 3 (19), pp. 4848-4851. [Online].