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HARVARD Citation
Xu, M. et al. (n.d.). Device parameter optimization for sub-20 nm node HK/MG-last bulk FinFETs*Project supported by the National 02 IC Projects and the Opening Project of Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences.. Journal of semiconductors. pp. 263-. [Online].