46.2: Invited Paper: Micron‐Patterned Deposition through Shadow masks with high precision alignment for OLED and e‐Paper applications. Issue 1 (1st July 2013)

• Record Type: Journal Article
• Authors: Ambrose, T.; Tamura, P.; Brocato, B.; Bucci, B.; Conrad, J.; Shelapinsky, J.; Sharma, P.; Little, S. Lauer and W.
• Is Part Of: Digest of technical papers. Volume 44:Issue 1(2013)
• Page Start: 637
• Page End: 639
• Publication Date: 2013-07-01
• Subjects: Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/j.2168-0159.2013.tb06291.x
• Languages: English
• ISSNs: 0097-966X

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>Conventional shadow‐mask alignment using mechanical pins or machine‐vision techniques achieve 5 micron alignment accuracy. Here we introduce a novel alignment system‐architecture based on coded apertures along with discrete photo detectors as the sensing elements. It allows submicron accuracy and repeatability making it highly suitable for display manufacturing applications.</p> </abstract>