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APA Citation
Koehler, F., Triyoso, D. H., Hussain, I., Antonioli, B., Hempel, K., Cristiano, F., Pichler, P., Tavernier, C., & Windl, W. (n.d.). challenges in spacer process development for leading‐edge high‐k metal gate technology. Physica status solidi, 11(1), 73–76. http://access.bl.uk/ark:/81055/vdc_100024885894.0x000012