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APA Citation
Liao, Z., Gall, M., Yeap, K. B., Sander, C., Aubel, O., Mühle, U., Gluch, J., Niese, S., Standke, Y., Rosenkranz, R., Löffler, M., Vogel, N., Beyer, A., Engelmann, H., Guttmann, P., Schneider, G., Zschech, E., & Zschech, E. (n.d.). a New In Situ Microscopy Approach to Study the Degradation and Failure Mechanisms of Time‐Dependent Dielectric Breakdown: Set‐Up and Opportunities1. Advanced engineering materials, 16(5), 486–493. http://access.bl.uk/ark:/81055/vdc_100024837085.0x000062