Large Area Resist‐Free Soft Lithographic Patterning of Graphene. Issue 5 (19th November 2012)

• Record Type: Journal Article
• Authors: George, Antony; Mathew, S.; van Gastel, Raoul; Nijland, Maarten; Gopinadhan, K.; Brinks, Peter; Venkatesan, T.; ten Elshof, Johan E.
• Is Part Of: Small. Volume 9:Issue 5(2013:Mar.)
• Page Start: 711
• Page End: 715
• Publication Date: 2012-11-19
• Subjects: Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.201201889
• Languages: English
• ISSNs: 1613-6810

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Large area low‐cost patterning</bold> is a challenging problem in graphene research. A resist‐free, single‐step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large‐area patterning of graphene for device applications. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg1vb23csp" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>