Large Area Resist‐Free Soft Lithographic Patterning of Graphene. Issue 5 (19th November 2012) - George, Antony
Abstract Large area low‐cost patterning is a challenging problem in graphene research. A resist‐free, single‐step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large‐area patterning of graphene for device applications.