Cite
HARVARD Citation
Frascaroli, J. et al. (n.d.). Surface passivation for ultrathin Al2O3 layers grown at low temperature by thermal atomic layer deposition. Physica status solidi. 210 (4), pp. 732-736. [Online].
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Frascaroli, J. et al. (n.d.). Surface passivation for ultrathin Al2O3 layers grown at low temperature by thermal atomic layer deposition. Physica status solidi. 210 (4), pp. 732-736. [Online].