Cite
HARVARD Citation
Guo, J. et al. (n.d.). A Water‐free Low Temperature Process for Atomic Layer Deposition of Al2O3 Films1. Chemical vapor deposition. 19 (4), pp. 156-160. [Online].
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Guo, J. et al. (n.d.). A Water‐free Low Temperature Process for Atomic Layer Deposition of Al2O3 Films1. Chemical vapor deposition. 19 (4), pp. 156-160. [Online].