Cite
HARVARD Citation
Li, X. et al. (n.d.). A Micro‐pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti‐Doping. Chemical vapor deposition. 19 (4), pp. 104-110. [Online].
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Li, X. et al. (n.d.). A Micro‐pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti‐Doping. Chemical vapor deposition. 19 (4), pp. 104-110. [Online].