Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals. (22nd November 2012) - Aissou, Karim
Abstract We have overcome the cost and time consumption limitations of common lithography techniques used to control the self‐assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub‐layer. The guiding pattern is a sinusoidal surface‐relief grating interferometrically inscribed onto an azobenzene containing copolymer sub‐layer leading to a defect‐free single grain of block copolymer domains.