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HARVARD Citation
Tsai, C. et al. (n.d.). O2/HMDSO‐Plasma‐Deposited Organic–Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin‐Film Transistor. Plasma processes and polymers. 11 (1), pp. 89-95. [Online].
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Tsai, C. et al. (n.d.). O2/HMDSO‐Plasma‐Deposited Organic–Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin‐Film Transistor. Plasma processes and polymers. 11 (1), pp. 89-95. [Online].