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HARVARD Citation
Hopstaken, M. et al. (n.d.). Physical characterization of sub‐32‐nm semiconductor materials and processes using advanced ion beam–based analytical techniques. Surface and interface analysis. pp. 338-344. [Online].
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Hopstaken, M. et al. (n.d.). Physical characterization of sub‐32‐nm semiconductor materials and processes using advanced ion beam–based analytical techniques. Surface and interface analysis. pp. 338-344. [Online].