Cite
HARVARD Citation
Shih, C. et al. (2013). Constraint Annealing of HfO2 Films on Silicon Substrate: Suppression of Si Outward Emission. Journal of the American Ceramic Society. 96 (2), pp. 376-378. [Online].
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Shih, C. et al. (2013). Constraint Annealing of HfO2 Films on Silicon Substrate: Suppression of Si Outward Emission. Journal of the American Ceramic Society. 96 (2), pp. 376-378. [Online].