Timing performance of nanometer digital circuits under process variations. ([2018])

• Record Type: Book
• Further Information: Note: Victor Champac, Jose Garcia Gervacio.
• Authors: Champac, Victor; Gervacio, Jose Garcia
• Contents: Intro; Preface; Contents; About the Authors; Acronyms; 1 Introduction; 1.1 Semiconductor Technology; 1.2 First Words of Process Variations on Semiconductor Technologies; 1.3 Making Modern Digital Circuits; 1.3.1 Nanometer Design; 1.3.2 Impact of Process Variation on Nanometer Design; 1.3.3 Corner-Based Nanometer Design; 1.4 Need of Statistical Circuit Design; References; 2 Mathematical Fundamentals; 2.1 Basic Definitions; 2.1.1 Definitions; 2.2 Random Variables; 2.2.1 Discrete Random Variables; 2.2.1.1 Probability Mass Function; 2.2.1.2 Cumulative Distribution Function. 2.2.2 Continuous Random Variables2.2.2.1 Probability Density Function; 2.2.2.2 Cumulative Distribution Function; 2.3 Characteristics of Random Variables; 2.3.1 Mean; 2.3.1.1 Discrete Variables; 2.3.1.2 Continuous Variables; 2.3.2 Variance; 2.3.2.1 Discrete Variables; 2.3.2.2 Continuous Variables; 2.4 Distributions of Random Variables; 2.4.1 Continuous Uniform Distribution; 2.4.2 Continuous Normal Distribution; 2.5 Relationship Properties of Random Variables; 2.5.1 Covariance; 2.5.1.1 Discrete Variables; 2.5.1.2 Continuous Variables; 2.5.2 Correlation; 2.6 Sum of Normal Random Variables. 2.6.1 Sum of Two Normal Random Variables2.6.1.1 Mean; 2.6.1.2 Variance; 2.6.2 Sum of More than Two Normal Random Variables; 2.6.2.1 Mean; 2.6.2.2 Variance; 2.7 Series and Theorem of Taylor; 2.7.1 Basic Definitions; 2.7.2 Single Variable; 2.7.3 Two Variables; 2.8 Summary; References; 3 Process Variations; 3.1 Introduction; 3.2 CMOS Manufacturing Process; 3.2.1 CMOS Technology Overview; 3.2.2 Main Manufacturing Processes; 3.2.2.1 Photolithography; 3.2.2.2 Etching; 3.2.2.3 Doping; 3.2.2.4 Deposition; 3.2.2.5 Planarization; 3.3 Sources of Process Variations. 3.3.1 Sources of Variation on Device Parameters3.3.1.1 Sources of Variation in the Channel Length; 3.3.1.2 Line Edge Roughness; 3.3.1.3 Optical Proximity Effect; 3.3.1.4 Sources of Variation in the Channel Width; 3.3.1.5 Sources of Variation in the Gate Oxide Thickness; 3.3.1.6 Sources of Variation in the Threshold Voltage; 3.3.1.7 Random Dopant Fluctuation; 3.3.2 Sources of Variation in Interconnections; 3.3.2.1 Chemical Mechanical Polishing; 3.4 Behavior of Process Parameter Variations; 3.4.1 Systematic; 3.4.2 Nonsystematic; 3.4.2.1 Inter-die Variations; 3.4.2.2 Intra-Die Variations. 3.5 Parameter Modeling3.6 Spatial Correlation Modeling; 3.6.1 Exponential Model; 3.6.1.1 Example; 3.6.2 Grid Model; 3.7 Summary; References; 4 Gate Delay Under Process Variations; 4.1 Mathematical Formulation of the Statistical Delay of a Logic Gate; 4.1.1 Mean Delay of a Gate; 4.1.2 Variance of the Delay of a Gate; 4.2 Delay of Logic Gates Under Process Variations; 4.3 Computing Delay Variance of an Inverter; 4.3.1 Analytical Delay Model; 4.3.2 Sensitivity Delay Model; 4.3.3 Example of Computing Delay Standard Deviation of an Inverter; 4.4 Computing Delay Variance of a Nand Gate.
• Publisher Details: Cham, Switzerland : Springer
• Publication Date: 2018
• Copyright Date: 2018
• Extent: 1 online resource
• Subjects: 621.3815; Engineering; Nanoelectronics -- Materials; Integrated circuits -- Design and construction; Radio circuits; TECHNOLOGY & ENGINEERING -- Mechanical; Integrated circuits -- Design and construction; Radio circuits; Computers -- Systems Architecture -- General; Technology & Engineering -- Electronics -- General; Computer architecture & logic design; Electronics engineering; Systems engineering; Computer science; Electronics; Technology & Engineering -- Electronics -- Circuits -- General; Circuits & components; Electronic books
• Languages: English
• ISBNs: 9783319754659; 3319754653
• Related ISBNs: 9783319754642; 3319754645
• Notes: Note: Includes bibliographical references and index.; Note: Vendor-supplied metadata.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.