Scientific wet process technology for innovative LSI/FPD manufacturing. (2018)

• Record Type: Book
• Further Information: Note: Edited by Tadahiro Ohmi.
• Editors: Ōmi, Tadahiro, 1939-
• Contents: Surface Chemical Electronics at the Semiconductor Surface; Tadahiro Ohmi; ; Principles of Semiconductor Device Wet Cleaning; Hitoshi Morinaga; ; High-Performance Wet-Cleaning Technology; Hiroshi Morita, Akinobu Teramoto, Senri Ojima, and Kerichi Mitshumori; ; Etching of Various SiO2; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, Jun Takano, and Akinobu Taramoto; ; Silicon Etching; Kenichi Mitsumori and Nobuhiko Inoue; ; Chemical Composition Control Technology; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, and Jun Takano; ; Wet Vapor Resist Stripping Technology; Senri Ojima and Tadahiro Ohmi; ; Antistatic Technology; Kenichi Mitsumori and Takashi Imaoka; ; Chemical Waste Reclamation Technology; Hiroshi Sugawara and Takashi Imaoka; ; Ultrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility; Ikunori Yokoi, Masaaki Nagase, Koji Nishino, Nobukazu Ikeda, Masafumi Kitano, Hiroto Izumi, and Tadahiro Ohmi
• Edition: 1st
• Publisher Details: Boca Raton : CRC Press
• Publication Date: 2018
• Extent: 1 online resource, illustrations (black and white)
• Subjects: 621.38152; Semiconductors -- Design and construction; Semiconductors -- Cleaning; Integrated circuits -- Design and construction
• Languages: English
• ISBNs: 9781351836968; 9781420026863; 9781351828277; 9781315221076
• Notes: Note: Description based on CIP data; resource not viewed.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.