Epitaxial growth of III-nitride compounds : computational approach /: computational approach. ([2018])
- Record Type:
- Book
- Title:
- Epitaxial growth of III-nitride compounds : computational approach /: computational approach. ([2018])
- Main Title:
- Epitaxial growth of III-nitride compounds : computational approach
- Further Information:
- Note: Takashi Matsuoka, Yoshihiro Kangawa, editors.
- Editors:
- Matsuoka, Takashi, 1947-
Kangawa, Yoshihiro - Contents:
- Intro; Preface; Contents; Contributors; 1 Introduction; 1.1 Purpose of the Book; 1.2 Outline of the Book; References; Fundamentals of Computational Approach to Epitaxial Growth of III-Nitride Compounds; 2 Computational Methods; 2.1 Ab Initio Calculations; 2.1.1 Density-Functional Theory; 2.1.2 Plane-Wave Basis Set; 2.1.3 Ab Initio Pseudopotential Method; 2.2 Empirical Interatomic Potentials; 2.3 Monte Carlo Simulations; References; 3 Fundamental Properties of III-Nitride Compounds; 3.1 Crystal Structure and Structural Stability; 3.2 Electronic Band Structure. 3.3 Miscibility of III-Nitride Alloy Semiconductors3.4 Dislocation Core Structures; 3.5 Compositional Inhomogeneity Around Threading Dislocations; References; 4 Fundamental Properties of III-Nitride Surfaces; 4.1 Surface Phase Diagram Calculations; 4.2 Surface Reconstructions on III-Nitride Compounds; 4.2.1 Polar AlN\left({0001} \right) and \left({000\bar{1}} \right) Surfaces; 4.2.2 Nonpolar AlN\left({1\bar{1}00} \right) and \left({11\bar{2}0} \right) Surfaces; 4.2.3 Semipolar AlN\left({1\bar{1}01} \right) and \left({11\bar{2}0} \right) Surfaces. 4.2.4 Polar GaN\left({0001} \right) and \left({000\bar{1}} \right) Surfaces4.2.5 Nonpolar GaN\left({1\bar{1}00} \right) and \left({11\bar{2}0} \right) Surfaces; 4.2.6 Semipolar GaN\left({1\bar{1}01} \right) and \left({11\bar{2}0} \right) Surfaces; 4.2.7 Polar InN\left({0001} \right) and \left({000\bar{1}} \right) Surfaces; 4.2.8 Nonpolar InN\left({1\bar{1}00} \right) andIntro; Preface; Contents; Contributors; 1 Introduction; 1.1 Purpose of the Book; 1.2 Outline of the Book; References; Fundamentals of Computational Approach to Epitaxial Growth of III-Nitride Compounds; 2 Computational Methods; 2.1 Ab Initio Calculations; 2.1.1 Density-Functional Theory; 2.1.2 Plane-Wave Basis Set; 2.1.3 Ab Initio Pseudopotential Method; 2.2 Empirical Interatomic Potentials; 2.3 Monte Carlo Simulations; References; 3 Fundamental Properties of III-Nitride Compounds; 3.1 Crystal Structure and Structural Stability; 3.2 Electronic Band Structure. 3.3 Miscibility of III-Nitride Alloy Semiconductors3.4 Dislocation Core Structures; 3.5 Compositional Inhomogeneity Around Threading Dislocations; References; 4 Fundamental Properties of III-Nitride Surfaces; 4.1 Surface Phase Diagram Calculations; 4.2 Surface Reconstructions on III-Nitride Compounds; 4.2.1 Polar AlN\left({0001} \right) and \left({000\bar{1}} \right) Surfaces; 4.2.2 Nonpolar AlN\left({1\bar{1}00} \right) and \left({11\bar{2}0} \right) Surfaces; 4.2.3 Semipolar AlN\left({1\bar{1}01} \right) and \left({11\bar{2}0} \right) Surfaces. 4.2.4 Polar GaN\left({0001} \right) and \left({000\bar{1}} \right) Surfaces4.2.5 Nonpolar GaN\left({1\bar{1}00} \right) and \left({11\bar{2}0} \right) Surfaces; 4.2.6 Semipolar GaN\left({1\bar{1}01} \right) and \left({11\bar{2}0} \right) Surfaces; 4.2.7 Polar InN\left({0001} \right) and \left({000\bar{1}} \right) Surfaces; 4.2.8 Nonpolar InN\left({1\bar{1}00} \right) and \left({11\bar{2}0} \right) Surfaces; 4.2.9 Semipolar InN\left({1\bar{1}01} \right) and \left({11\bar{2}0} \right) Surfaces; 4.3 Hydrogen Adsorption on III-Nitride Compounds. 4.3.1 Structures of AlN Surfaces with Hydrogen4.3.2 Surface Phase Diagrams for Hydrogen Adsorption on AlN Surfaces; 4.3.3 Structures of GaN Surfaces with Hydrogen; 4.3.4 Surface Phase Diagrams for Hydrogen Adsorption on GaN Surfaces; 4.3.5 Structures of InN Surfaces with Hydrogen; 4.3.6 Surface Phase Diagrams for Hydrogen Adsorption on InN Surfaces; References; Applications of Computational Approach to Epitaxial Growth of III-Nitride Compounds; 5 Thermodynamic Approach to InN Epitaxy; 5.1 Thermodynamic Approach; 5.1.1 Modeling InN MOVPE; 5.1.2 Surface Energy Calculation. 5.2 Surface Phase Diagram of InN Under MOVPE Condition5.3 Growth of InN by Pressurized-Reactor MOVPE; References; 6 Atomic Arrangement and In Composition in InGaN Quantum Wells; 6.1 Atomic Arrangement in InGaN; 6.1.1 Stability of Tetrahedral Clusters; 6.1.2 Monte Carlo Simulation of InGaN MOVPE; 6.2 In Incorporation in InGaN QWs; 6.2.1 Effective Enthalpy of Mixing of Coherently Grown InGaN Layers; 6.2.2 Thermodynamic Analysis of InGaN Hetero-Epitaxy; References; 7 Initial Epitaxial Growth Processes of III-Nitride Compounds; 7.1 Adatom Kinetics on AlN Polar Surfaces During MOVPE. … (more)
- Publisher Details:
- Cham, Switzerland : Springer
- Publication Date:
- 2018
- Copyright Date:
- 2018
- Extent:
- 1 online resource
- Subjects:
- 621.38152
Materials science
Nitrides
Epitaxy
TECHNOLOGY & ENGINEERING -- Mechanical
Epitaxy
Nitrides
Technology & Engineering -- Electronics -- Semiconductors
Science -- Mathematical Physics
Technology & Engineering -- Material Science
Science -- Crystallography
Semi-conductors & super-conductors
Mathematical physics
Materials science
Condensed matter physics (liquid state & solid state physics)
Optical materials
Surfaces (Physics)
Crystallography
Electronic devices & materials
Electronic books - Languages:
- English
- ISBNs:
- 9783319766416
3319766414 - Related ISBNs:
- 9783319766409
3319766406 - Notes:
- Note: Includes bibliographical references and index.
Note: Online resource; title from PDF title page (SpringerLink, viewed April 24, 2018). - Access Rights:
- Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
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