1. Highly selective isotropic gas-phase etching of SiO2 using HF and methanol at temperatures –30 °C and lower. (10th March 2023) Authors: Hattori, T.; Kobayashi, H.; Ohtake, H.; Akinaga, K.; Kurosaki, Y.; Takei, A.; Sekiguchi, A.; Maeda, K.; Takubo, C.; Yamada, M. Journal: Japanese journal of applied physics Issue: Volume 62:Number SI(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Highly selective isotropic gas-phase etching of SiO2 using HF and methanol at temperatures –30 °C and lower. (10th March 2023) Authors: Hattori, T.; Kobayashi, H.; Ohtake, H.; Akinaga, K.; Kurosaki, Y.; Takei, A.; Sekiguchi, A.; Maeda, K.; Takubo, C.; Yamada, M. Journal: Japanese journal of applied physics Issue: Volume 62:Number SI(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Highly selective isotropic gas-phase etching of SiO2 using HF and methanol at temperatures –30 °C and lower. (10th March 2023) Authors: Hattori, T.; Kobayashi, H.; Ohtake, H.; Akinaga, K.; Kurosaki, Y.; Takei, A.; Sekiguchi, A.; Maeda, K.; Takubo, C.; Yamada, M. Journal: Japanese journal of applied physics Issue: Volume 62:Number SI(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Highly selective isotropic gas-phase etching of SiO2 using HF and methanol at temperatures –30 °C and lower. (10th March 2023) Authors: Hattori, T.; Kobayashi, H.; Ohtake, H.; Akinaga, K.; Kurosaki, Y.; Takei, A.; Sekiguchi, A.; Maeda, K.; Takubo, C.; Yamada, M. Journal: Japanese journal of applied physics Issue: Volume 62:Number SI(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Highly selective isotropic gas-phase etching of SiO2 using HF and methanol at temperatures –30 °C and lower. (1st July 2023) Authors: Hattori, T.; Kobayashi, H.; Ohtake, H.; Akinaga, K.; Kurosaki, Y.; Takei, A.; Sekiguchi, A.; Maeda, K.; Takubo, C.; Yamada, M. Journal: Japanese journal of applied physics Issue: Volume 62:Number SI(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗