1. Investigation of Thermal Atomic Layer Deposited TaAlC with Low Effective Work-Function on HfO2 Dielectric Using TaCl5 and TEA as Precursors. (17th December 2016) Authors: Xiang, Jinjuan; Wang, Xiaolei; Li, Tingting; Gao, Jianfeng; Han, Kai; Yu, Jiahan; Wang, Wenwu; Li, Junfeng; Zhao, Chao Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 1(2017) Page Start: P38 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Investigation of Thermal Atomic Layer Deposited TaAlC with Low Effective Work-Function on HfO2 Dielectric Using TaCl5 and TEA as Precursors. (1st January 2017) Authors: Xiang, Jinjuan; Wang, Xiaolei; Li, Tingting; Gao, Jianfeng; Han, Kai; Yu, Jiahan; Wang, Wenwu; Li, Junfeng; Zhao, Chao Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 1(2017) Page Start: P38 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Thermal Atomic Layer Deposition of TaAlC with TaCl5 and TMA as Precursors. (1st January 2016) Authors: Xiang, Jinjuan; Li, Tingting; Wang, Xiaolei; Du, Liyong; Ding, Yuqiang; Wang, Wenwu; Li, Junfeng; Zhao, Chao Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 10(2016) Page Start: P633 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Thermal Atomic Layer Deposition of TaAlC with TaCl5 and TMA as Precursors. (27th September 2016) Authors: Xiang, Jinjuan; Li, Tingting; Wang, Xiaolei; Du, Liyong; Ding, Yuqiang; Wang, Wenwu; Li, Junfeng; Zhao, Chao Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 10(2016) Page Start: P633 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗