1. Effect of Y concentration and film thickness on microstructure and electrical properties of HfO2 based thin films. Issue 9 (1st May 2021) Authors: Liang, Hailong; Zhang, Bo; Zhou, Dayu; Guo, Xintai; Li, Yan; Lu, Yanqing; Guo, Yuanyuan Journal: Ceramics international Issue: Volume 47:Issue 9(2021) Page Start: 12137 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗