1. Communication—The Impact of TaN Barrier Processes on Different Ultra Low-k Dielectrics. (1st January 2015) Authors: Zhang, Xunyuan; Gillot, Christophe; Zhao, Larry; Ryan, E. Todd; Wu, Chen Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 12(2015) Page Start: N160 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Communication—The Impact of TaN Barrier Processes on Different Ultra Low-k Dielectrics. (20th October 2015) Authors: Zhang, Xunyuan; Gillot, Christophe; Zhao, Larry; Ryan, E. Todd; Wu, Chen Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 12(2015) Page Start: N160 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗