1. Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET. (1st January 2015) Authors: Xiang, Jinjuan; Li, Tingting; Zhang, Yanbo; Wang, Xiaolei; Gao, Jianfeng; Cui, Hushan; Yin, Huaxiang; Li, Junfeng; Wang, Wenwu; Ding, Yuqiang; Xu, Chongying; Zhao, Chao Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 12(2015) Page Start: P441 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET. (20th October 2015) Authors: Xiang, Jinjuan; Li, Tingting; Zhang, Yanbo; Wang, Xiaolei; Gao, Jianfeng; Cui, Hushan; Yin, Huaxiang; Li, Junfeng; Wang, Wenwu; Ding, Yuqiang; Xu, Chongying; Zhao, Chao Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 12(2015) Page Start: P441 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET. (20th October 2015) Authors: Xiang, Jinjuan; Li, Tingting; Zhang, Yanbo; Wang, Xiaolei; Gao, Jianfeng; Cui, Hushan; Yin, Huaxiang; Li, Junfeng; Wang, Wenwu; Ding, Yuqiang; Xu, Chongying; Zhao, Chao Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 12(2015) Page Start: P441 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗