Subject: atomic layer depisition -- FinFET -- metal -- TiAlC -- work function - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Subject atomic layer depisition -- FinFET -- metal -- TiAlC -- work function

1. Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET. (1st January 2015)

Authors:: Xiang, Jinjuan; Li, Tingting; Zhang, Yanbo; Wang, Xiaolei; Gao, Jianfeng; Cui, Hushan; Yin, Huaxiang; Li, Junfeng; Wang, Wenwu; Ding, Yuqiang; Xu, Chongying; Zhao, Chao
Journal:: ECS journal of solid state science and technology
Issue:: Volume 4:Number 12(2015)
Page Start:: P441
Record Type:: Journal Article
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗

2. Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET. (20th October 2015)

Authors:: Xiang, Jinjuan; Li, Tingting; Zhang, Yanbo; Wang, Xiaolei; Gao, Jianfeng; Cui, Hushan; Yin, Huaxiang; Li, Junfeng; Wang, Wenwu; Ding, Yuqiang; Xu, Chongying; Zhao, Chao
Journal:: ECS journal of solid state science and technology
Issue:: Volume 4:Number 12(2015)
Page Start:: P441
Record Type:: Journal Article
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗

3. Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET. (20th October 2015)

Authors:: Xiang, Jinjuan; Li, Tingting; Zhang, Yanbo; Wang, Xiaolei; Gao, Jianfeng; Cui, Hushan; Yin, Huaxiang; Li, Junfeng; Wang, Wenwu; Ding, Yuqiang; Xu, Chongying; Zhao, Chao
Journal:: ECS journal of solid state science and technology
Issue:: Volume 4:Number 12(2015)
Page Start:: P441
Record Type:: Journal Article
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗