1. Plasma-Induced Damage on the Reliability of Hf-Based High-k/Dual Metal-Gates Complementary Metal Oxide Semiconductor Technology. (19th November 2009) Authors: Weng, Wu-Te; Lee, Yao-Jen; Lin, Horng-Chih; Huang, Tiao-Yuan Other Names: Chu Paul K. Academic Editor. Journal: International journal of plasma science and engineering Issue: Volume 2009(2009) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗