1. Opportunities and Challenges in APT Metrology for Semiconductor Applications. (August 2019) Authors: Fleischmann, Claudia; Cuduvally, Ramya; Morris, Richard; Melkonyan, Davit; de Beeck, Jonathan Op; Makhotkin, Igor; van der Heide, Paul; Vandervorst, Wilfried Journal: Microscopy and microanalysis Issue: Volume 25:(2022)Supplement 2 Page Start: 312 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗