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1. Cover Feature: Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide (Chem. Eur. J. 31/2019). Issue 31 (26th April 2019)

2. Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. Issue 1 (25th November 2018)

4. A study on the influence of ligand variation on formamidinate complexes of yttrium: new precursors for atomic layer deposition of yttrium oxide. Issue 37 (24th August 2021)

5. Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of their Manifold Structural Chemistry and Thermal Properties. Issue 48 (12th November 2021)

6. Ein seltenes Low‐Spin‐CoIV‐Bis(β‐silyldiamid) mit hoher thermischer Stabilität: Sterische Erzwingung einer Dublettkonfiguration. (8th June 2020)

7. A Rare Low‐Spin CoIV Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration. Issue 33 (8th June 2020)

10. Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction. Issue 35 (26th October 2022)