1. Communication—Corrosion Behavior of Tungsten Metal Gate in the Presence of Hydrogen Peroxide at Acidic Medium. (1st January 2017) Authors: Seo, Jihoon; You, Keungtae; Moon, Jinok; Kim, Joo Hyun; Paik, Ungyu Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 4(2017) Page Start: P169 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Communication—Corrosion Behavior of Tungsten Metal Gate in the Presence of Hydrogen Peroxide at Acidic Medium. (28th February 2017) Authors: Seo, Jihoon; You, Keungtae; Moon, Jinok; Kim, Joo Hyun; Paik, Ungyu Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 4(2017) Page Start: P169 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Communication—Selective Adsorption of PEG on SiO2 for High Removal Selectivity in Tungsten CMP. (1st January 2018) Authors: Kim, Kijung; Lee, Kangchun; So, Sounghyun; Cho, Sungwook; Lee, Myeongjae; You, Keungtae; Moon, Jinok; Song, Taeseup Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 3(2018) Page Start: P132 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Communication—Selective Adsorption of PEG on SiO2 for High Removal Selectivity in Tungsten CMP. (6th March 2018) Authors: Kim, Kijung; Lee, Kangchun; So, Sounghyun; Cho, Sungwook; Lee, Myeongjae; You, Keungtae; Moon, Jinok; Song, Taeseup Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 3(2018) Page Start: P132 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Control of Tungsten Protrusion with Surface Active Agent during Tungsten Chemical Mechanical Polishing. (1st January 2017) Authors: You, Keungtae; Seo, Jihoon; Kim, Patrick Joo Hyun; Song, Taeseup Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 12(2017) Page Start: P822 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Control of Tungsten Protrusion with Surface Active Agent during Tungsten Chemical Mechanical Polishing. (29th November 2017) Authors: You, Keungtae; Seo, Jihoon; Kim, Patrick Joo Hyun; Song, Taeseup Journal: ECS journal of solid state science and technology Issue: Volume 6:Number 12(2017) Page Start: P822 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Fenton-Like Reaction between Copper Ions and Hydrogen Peroxide for High Removal Rate of Tungsten in Chemical Mechanical Planarization. (14th February 2018) Authors: Kim, Kijung; Lee, Kangchun; So, Sounghyun; Cho, Sungwook; Lee, Myeongjae; You, Keungtae; Moon, Jinok; Song, Taeseup Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 3(2018) Page Start: P91 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Fenton-Like Reaction between Copper Ions and Hydrogen Peroxide for High Removal Rate of Tungsten in Chemical Mechanical Planarization. (1st January 2018) Authors: Kim, Kijung; Lee, Kangchun; So, Sounghyun; Cho, Sungwook; Lee, Myeongjae; You, Keungtae; Moon, Jinok; Song, Taeseup Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 3(2018) Page Start: P91 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Multi-objective optimization of tungsten CMP slurry for advanced semiconductor manufacturing using a response surface methodology. (5th March 2017) Authors: Seo, Jihoon; Kim, Joo Hyun; Lee, Myoungjae; You, Keungtae; Moon, Jinok; Lee, Dong-Hee; Paik, Ungyu Journal: Materials & design Issue: Volume 117(2017) Page Start: 131 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗