Communication—Corrosion Behavior of Tungsten Metal Gate in the Presence of Hydrogen Peroxide at Acidic Medium. (28th February 2017)

• Record Type: Journal Article
• Authors: Seo, Jihoon; You, Keungtae; Moon, Jinok; Kim, Joo Hyun; Paik, Ungyu
• Is Part Of: ECS journal of solid state science and technology. Volume 6:Number 4(2017)
• Page Start: P169
• Page End: P171
• Publication Date: 2017-02-28
• Subjects: Corrosion -- Dissolution -- Kinetics -- Thermodynamics -- Tungsten gates; Solid state chemistry -- Periodicals; Electronics -- Materials -- Periodicals; Electrochemistry -- Periodicals; 541.0421
• DOI: 10.1149/2.0311704jss
• Languages: English
• ISSNs: 2162-8777

Abstract

Abstract : Herein, the corrosion behaviors of W metal gates in the presence of H2 O2 at the acidic medium were investigated as a function of dipping time, temperature, and H2 O2 concentration. We determined the kinetic constants (i.e. k w and k h ) based on the experimental data. The activation energy ( E a ) are calculated from the Arrhenius equation. Thermodynamic parameters (Δ G ‡, Δ H ‡, and Δ S ‡ ) for the dissolution were determined based on the Eyring plot. These results investigated in this study will provide researchers the prior information on parameters to control the corrosion behaviors of W metal gates during the chemical mechanical planarization (CMP) process.