1. Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf0.5Zr0.5)O2 thin films deposited on various substrates. (1st November 2017) Authors: Shiraishi, Takahisa; Katayama, Kiliha; Yokouchi, Tatsuhiko; Shimizu, Takao; Oikawa, Takahiro; Sakata, Osami; Uchida, Hiroshi; Imai, Yasuhiko; Kiguchi, Takanori; Konno, Toyohiko J.; Funakubo, Hiroshi Journal: Materials science in semiconductor processing Issue: Volume 70(2017) Page Start: 239 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗