11. Doping profile optimisation in bulk FinFET channel and source/drain extension regions for low off–state leakage. (5th December 2014) Authors: Zhang, Keke; Liu, Yunfei; Zhu, Huilong; Zhao, Chao; Ye, Tianchun; Yin, Haizhou Journal: International journal of nanotechnology Issue: Volume 12:Number 1/2(2015) Page Start: 111 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
12. Effects of defects and thermal treatment on the properties of graphene. (June 2015) Authors: Jia, Kunpeng; Su, Yajuan; Chen, Yang; Luo, Jun; Yang, Jie; Lv, Peng; Zhang, Zihan; Zhu, Huilong; Zhao, Chao; Ye, Tianchun Journal: Vacuum Issue: Volume 116(2015) Page Start: 90 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
13. Effects of Ni Film Thickness on the Properties of Ni-Based Silicides Formed on Both Highly Doped n- and p-Si Substrate. (19th February 2020) Authors: Zhang, Dan; Sheng, Jie; Zhao, Chao; Xu, Jing; Gao, Jianfeng; Mao, Shujuan; Men, Yang; Liu, Pengfei; Zhang, Jing; Luo, Xue; Li, Junfeng; Wang, Wenwu; Chen, Dapeng; Ye, Tianchun; Luo, Jun Journal: ECS journal of solid state science and technology Issue: Volume 9:Number 3(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
14. Enhanced aggregation scheduler design in industrial 802.11 devices. Issue 15 (1st July 2017) Authors: Qian, Xu; Wu, Bin; Ye, Tianchun Journal: Electronics letters Issue: Volume 53:Issue 15(2017) Page Start: 1073 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
15. Enhancing the thermal stability of NiGe by prior-germanidation fluorine implantation into Ge substrate. (20th June 2018) Authors: Duan, Ningyuan; Wang, Guilei; Xu, Jing; Mao, Shujuan; Luo, Xue; Zhang, Dan; Wang, Wenwu; Chen, Dapeng; Li, Junfeng; Liu, Shi; Zhao, Chao; Ye, Tianchun; Luo, Jun Journal: Japanese journal of applied physics Issue: Volume 57:Number 7(2018)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
16. Evaluation of hole mobility degradation by remote Coulomb scattering in Ge pMOSFETs. (12th June 2019) Authors: Han, Kai; Wang, Xiaolei; Xiang, Jinjuan; Zhou, Lixing; Zhang, Jiazhen; Wang, Yanrong; Ma, Xueli; Yang, Hong; Zhang, Jing; Zhao, Chao; Ye, Tianchun; Wang, Wenwu Journal: Semiconductor science and technology Issue: Volume 34:Number 7(2019) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
17. Evaluation of PMMA Residues as a Function of Baking Temperature and a Graphene Heat-Free-Transfer Process to Reduce Them. (19th December 2015) Authors: Jia, Kunpeng; Luo, Jun; Hu, Rongyan; Zhan, Jun; Cao, Heshi; Su, Yajuan; Zhu, Huilong; Xie, Ling; Zhao, Chao; Chen, Dapeng; Ye, Tianchun Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 3(2016) Page Start: P138 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
18. Evaluation of PMMA Residues as a Function of Baking Temperature and a Graphene Heat-Free-Transfer Process to Reduce Them. (1st January 2016) Authors: Jia, Kunpeng; Luo, Jun; Hu, Rongyan; Zhan, Jun; Cao, Heshi; Su, Yajuan; Zhu, Huilong; Xie, Ling; Zhao, Chao; Chen, Dapeng; Ye, Tianchun Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 3(2016) Page Start: P138 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
19. Exploration of the impact of interface states density on the specific contact resistivity in TiSix/n+-Si Ohmic contacts through high-low frequency method. (13th June 2019) Authors: Zhang, Dan; Mao, Shujuan; Wang, Guilei; Xu, Jing; Luo, Xue; Zhao, Chao; Li, Junfeng; Wang, Wenwu; Chen, Dapeng; Ye, Tianchun; Luo, Jun Journal: Japanese journal of applied physics Issue: Volume 58:Number SH(2019) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
20. Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching. (16th November 2017) Authors: Li, Hailiang; Ye, Tianchun; Shi, Lina; Xie, Changqing Journal: Journal of micromechanics and microengineering Issue: Volume 27:Number 12(2017:Dec.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗