1. Silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge. Issue 1 (1st December 2016) Authors: Scopece, Daniele; Döbeli, Max; Passerone, Daniele; Maeder, Xavier; Neels, Antonia; Widrig, Beno; Dommann, Alex; Müller, Ulrich; Ramm, Jürgen Journal: Science and technology of advanced materials Issue: Volume 17:Issue 1(2016) Page Start: 20 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge. Issue 1 (1st January 2016) Authors: Scopece, Daniele; Döbeli, Max; Passerone, Daniele; Maeder, Xavier; Neels, Antonia; Widrig, Beno; Dommann, Alex; Müller, Ulrich; Ramm, Jürgen Journal: Science and technology of advanced materials Issue: Volume 17:Issue 1(2016) Page Start: 20 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗