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2. Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer‐based positive‐tone photoresist materials. Issue 2 (22nd August 2014)

5. Directing Self‐Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope. Issue 4 (17th December 2013)