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Author/Creator Thackeray, James W.

1. Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer‐based positive‐tone photoresist materials. Issue 2 (22nd August 2014)

Authors:
Sun, Guorong; Cho, Sangho; Yang, Fan; He, Xun; Pavía‐Sanders, Adriana; Clark, Corrie; Raymond, Jeffery E.; Verkhoturov, Stanislav V.; Schweikert, Emile A.; Thackeray, James W.; Trefonas, Peter; Wooley, Karen L.
Journal:
Journal of polymer science
Issue:
Volume 53:Issue 2(2015:Jan.)
Page Start:
193
Record Type:
Journal Article
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2. Directing Self‐Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope. Issue 4 (17th December 2013)

Authors:
Cho, Sangho; Yang, Fan; Sun, Guorong; Eller, Michael J.; Clark, Corrie; Schweikert, Emile A.; Thackeray, James W.; Trefonas, Peter; Wooley, Karen L.; Lutz, J.‐F.; Sumerlin, B.; Matyjaszewski, K.
Journal:
Macromolecular rapid communications
Issue:
Volume 35:Issue 4(2014:Feb.)
Page Start:
437
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗