1. A high-precision current measurement platform applied for statistical measurement of discharge current transient spectroscopy of traps in SiN dielectrics. (27th July 2021) Authors: Saito, Koga; Suzuki, Hayato; Park, Hyeonwoo; Kuroda, Rihito; Teramoto, Akinobu; Suwa, Tomoyuki; Sugawa, Shigetoshi Journal: Japanese journal of applied physics Issue: Volume 60:Number 8(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Effect of drain current on appearance probability and amplitude of random telegraph noise in low-noise CMOS image sensors. (14th March 2018) Authors: Ichino, Shinya; Mawaki, Takezo; Teramoto, Akinobu; Kuroda, Rihito; Park, Hyeonwoo; Wakashima, Shunichi; Goto, Tetsuya; Suwa, Tomoyuki; Sugawa, Shigetoshi Journal: Japanese journal of applied physics Issue: Volume 57:Number 4(2018)Supplement Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Effect of Hydrogen on Silicon Nitrides Formation by Microwave Excited Plasma Enhanced Chemical Vapor Deposition. (31st March 2015) Authors: Teramoto, Akinobu; Nakao, Yukihisa; Suwa, Tomoyuki; Hashimoto, Keiichi; Motoya, Tsukasa; Hirayama, Masaki; Sugawa, Shigetoshi; Ohmi, Tadahiro Journal: ECS transactions Issue: Volume 66:Number 4(2015) Page Start: 151 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Effect of Oxygen Impurity on Nitrogen Radicals in Post-Discharge Flows. (10th December 2015) Authors: Shiba, Yoshinobu; Teramoto, Akinobu; Suwa, Tomoyuki; Watanabe, Kensuke; Nishimura, Shinichi; Shirai, Yasuyuki; Sugawa, Shigetoshi Journal: ECS transactions Issue: Volume 69:Number 39(2015) Page Start: 1 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Effect of Process Temperature of Al2O3 Atomic Layer Deposition Using Accurate Process Gasses Supply System. (31st March 2015) Authors: Sugita, Hisaya; Koda, Yasumasa; Suwa, Tomoyuki; Kuroda, Rihito; Goto, Tetsuya; Ishii, Hidekazu; Yamashita, Satoru; Teramoto, Akinobu; Sugawa, Shigetoshi; Ohmi, Tadahiro Journal: ECS transactions Issue: Volume 66:Number 4(2015) Page Start: 305 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Evaluating Work-Function and Composition of ErSix on Various Surface Orientation of Silicon. (1st January 2016) Authors: Teramoto, Akinobu; Tanaka, Hiroaki; Suwa, Tomoyuki; Goto, Tetsuya; Kuroda, Rihito; Motoya, Tsukasa; Kawase, Kazumasa; Sugawa, Shigetoshi Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 10(2016) Page Start: P608 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Evaluating Work-Function and Composition of ErSix on Various Surface Orientation of Silicon. (21st September 2016) Authors: Teramoto, Akinobu; Tanaka, Hiroaki; Suwa, Tomoyuki; Goto, Tetsuya; Kuroda, Rihito; Motoya, Tsukasa; Kawase, Kazumasa; Sugawa, Shigetoshi Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 10(2016) Page Start: P608 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Experimental investigation of localized stress-induced leakage current distribution in gate dielectrics using array test circuit. (13th March 2018) Authors: Park, Hyeonwoo; Teramoto, Akinobu; Kuroda, Rihito; Suwa, Tomoyuki; Sugawa, Shigetoshi Journal: Japanese journal of applied physics Issue: Volume 57:Number 4(2018)Supplement Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Influence of silicon wafer surface roughness on semiconductor device characteristics. (26th May 2020) Authors: Mori, Keiichiro; Samata, Shuichi; Mitsugi, Noritomo; Teramoto, Akinobu; Kuroda, Rihito; Suwa, Tomoyuki; Hashimoto, Keiichi; Sugawa, Shigetoshi Journal: Japanese journal of applied physics Issue: Volume 59:Number SM(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Introduction of a High Selectivity Etching Process with Advanced SiNx Etch Gas in the Fabrication of FinFET Structures. (4th May 2016) Authors: Kojiri, Takashi; Suwa, Tomoyuki; Hashimoto, Keiichi; Teramoto, Akinobu; Kuroda, Rihito; Sugawa, Shigetoshi Journal: ECS transactions Issue: Volume 72:Number 4(2016) Page Start: 23 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗