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3. A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI‐LPCVD) for the Deposition of Thin Films1 . Issue 8 (12th May 2017)

4. Comprehensive comparison and experimental validation of band-structure calculation methods in III–V semiconductor quantum wells. (January 2016)

5. Direct Liquid Injection − Low Pressure Chemical Vapor Deposition of Silica Thin Films from Di‐t‐butoxydiacetoxysilane. Issue 12 (17th July 2017)

6. Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights. Issue 2 (1st June 2022)

7. Filamentary TaOx/HfO2 ReRAM Devices for Neural Networks Training with Analog In‐Memory Computing. (10th July 2022)

10. Microstructure and ferroelectricity of BaTiO3 thin films on Si for integrated photonics. (13th January 2017)