1. Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100 °C for moisture barrier applications. (25th October 2018) Authors: Zhu, Zhen; Sippola, Perttu; Lipsanen, Harri; Savin, Hele; Merdes, Saoussen Journal: Japanese journal of applied physics Issue: Volume 57:Number 12(2018) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Silicon dioxide mask by plasma enhanced atomic layer deposition in focused ion beam lithography. (20th January 2017) Authors: Liu, Zhengjun; Shah, Ali; Alasaarela, Tapani; Chekurov, Nikolai; Savin, Hele; Tittonen, Ilkka Journal: Nanotechnology Issue: Volume 28:Number 8(2017) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Predictable quantum efficient detector based on n-type silicon photodiodes. (4th October 2017) Authors: Dönsberg, Timo; Manoocheri, Farshid; Sildoja, Meelis; Juntunen, Mikko; Savin, Hele; Tuovinen, Esa; Ronkainen, Hannu; Prunnila, Mika; Merimaa, Mikko; Tang, Chi Kwong; Gran, Jarle; Müller, Ingmar; Werner, Lutz; Rougié, Bernard; Pons, Alicia; Smîd, Marek; Gál, Péter; Lolli, Lapo; Brida, Giorgio; Ras... Journal: Metrologia Issue: Volume 54:Number 6(2017:Dec.) Page Start: 821 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Effect of low-temperature annealing on defect causing copper-related light-induced degradation in p-type silicon. (September 2017) Authors: Vahlman, Henri; Haarahiltunen, Antti; Kwapil, Wolfram; Schön, Jonas; Yli-Koski, Marko; Inglese, Alessandro; Modanese, Chiara; Savin, Hele Journal: Energy procedia Issue: Volume 124(2017) Page Start: 188 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Efficient surface passivation of black silicon using spatial atomic layer deposition. (September 2017) Authors: Heikkinen, Ismo T.S.; Repo, Päivikki; Vähänissi, Ville; Pasanen, Toni; Malinen, Ville; Savin, Hele Journal: Energy procedia Issue: Volume 124(2017) Page Start: 282 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Surface passivation of black silicon phosphorus emitters with atomic layer deposited SiO2/Al2O3 stacks. (September 2017) Authors: Pasanen, Toni; Vähänissi, Ville; Theut, Nicholas; Savin, Hele Journal: Energy procedia Issue: Volume 124(2017) Page Start: 307 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Impact of black silicon on light‐ and elevated temperature‐induced degradation in industrial passivated emitter and rear cells. (4th December 2018) Authors: Pasanen, Toni P.; Modanese, Chiara; Vähänissi, Ville; Laine, Hannu S.; Wolny, Franziska; Oehlke, Alexander; Kusterer, Christian; Heikkinen, Ismo T.S.; Wagner, Matthias; Savin, Hele Journal: Progress in photovoltaics Issue: Volume 27:Number 11(2019) Page Start: 918 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Approaches to open source 3-D printable probe positioners and micromanipulators for probe stations. (October 2018) Authors: Hietanen, Iiro; Heikkinen, Ismo T.S.; Savin, Hele; Pearce, Joshua M. Journal: HardwareX Issue: Volume 4(2018) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Black silicon back‐contact module with wide light acceptance angle. (11th December 2019) Authors: Ortega, Pablo; Garín, Moises; von Gastrow, Guillaume; Savisalo, Tuukka; Tolvanen, Antti; Vahlman, Henri; Vähänissi, Ville; Pasanen, Toni P.; Carrió, David; Savin, Hele; Alcubilla, Ramón Journal: Progress in photovoltaics Issue: Volume 28:Number 3(2020) Page Start: 210 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications. Issue 8 (30th September 2019) Authors: Zhu, Zhen; Merdes, Saoussen; Ylivaara, Oili M. E.; Mizohata, Kenichiro; Heikkilä, Mikko J.; Savin, Hele Journal: Physica status solidi Issue: Volume 217:Issue 8(2020) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗