1. Communication—The Impact of TaN Barrier Processes on Different Ultra Low-k Dielectrics. (1st January 2015) Authors: Zhang, Xunyuan; Gillot, Christophe; Zhao, Larry; Ryan, E. Todd; Wu, Chen Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 12(2015) Page Start: N160 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Communication—The Impact of TaN Barrier Processes on Different Ultra Low-k Dielectrics. (20th October 2015) Authors: Zhang, Xunyuan; Gillot, Christophe; Zhao, Larry; Ryan, E. Todd; Wu, Chen Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 12(2015) Page Start: N160 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Stress determination through diffraction: establishing the link between Kröner and Voigt/Reuss limits. Issue 2 (8th May 2015) Authors: Murray, Conal E.; Jordan-Sweet, Jean L.; Bedell, Stephen W.; Ryan, E. Todd Journal: Powder diffraction Issue: Volume 30:Issue 2(2015) Page Start: 99 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗