1. Beware of Artifacts When Characterizing Nanometer Device Features Smaller than a TEM Lamella Thickness in Semiconductor Wafer-foundries. (August 2014) Authors: Zhao, Wayne; Porter, Hugh; Rai, Raghaw; Chen, Esther (PY); Russell, Jeremy Journal: Microscopy and microanalysis Issue: Volume 20(2014)Supplement 3 Page Start: 1000 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Beware of Artifacts When Characterizing Nanometer Device Features Smaller than a TEM Lamella Thickness in Semiconductor Wafer-foundries. (August 2014) Authors: Zhao, Wayne; Porter, Hugh; Rai, Raghaw; Chen, Esther (PY); Russell, Jeremy Journal: Microscopy and microanalysis Issue: Volume 20:Number 3(2014:Jun.) Page Start: 1000 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗